11![Photronics Relies on Synopsys for Photomask Manufacturing Solutions “We selected Synopsys to be our primary EDA partner because they are the only EDA company that delivers the complete range of design solutions we need Photronics Relies on Synopsys for Photomask Manufacturing Solutions “We selected Synopsys to be our primary EDA partner because they are the only EDA company that delivers the complete range of design solutions we need](https://www.pdfsearch.io/img/bfa0e4d89eacfbc9735cb81b903f4757.jpg) | Add to Reading ListSource URL: www.synopsys.comLanguage: English - Date: 2014-11-07 14:34:10
|
---|
12![PROJECT PROFILE 2T304: Lithography based on quite extreme ultra high NA 193 nm optical immersion development (LIQUID) LITHOGRAPHY PROJECT PROFILE 2T304: Lithography based on quite extreme ultra high NA 193 nm optical immersion development (LIQUID) LITHOGRAPHY](https://www.pdfsearch.io/img/af58c22efa215435f47b2c5321a895c7.jpg) | Add to Reading ListSource URL: www.catrene.orgLanguage: English - Date: 2009-03-25 10:36:09
|
---|
13![T401-medea+ LO1[removed]:11 T401-medea+ LO1[removed]:11](https://www.pdfsearch.io/img/b4c8f331a112460ca2959f2ee2dba056.jpg) | Add to Reading ListSource URL: www.catrene.orgLanguage: English - Date: 2009-03-25 10:37:10
|
---|
14![](https://www.pdfsearch.io/img/9c6c09b95456ad6c2aa576fa85d73509.jpg) | Add to Reading ListSource URL: s3.mentor.com.s3.amazonaws.comLanguage: English - Date: 2012-06-14 13:53:12
|
---|
15![INTERNATIONAL TECHNOLOGY ROADMAP FOR INTERNATIONAL TECHNOLOGY ROADMAP FOR](https://www.pdfsearch.io/img/15d4c198400babc120db9243562e9809.jpg) | Add to Reading ListSource URL: www.itrs.netLanguage: English - Date: 2012-01-10 11:47:02
|
---|
16![](https://www.pdfsearch.io/img/64532b5ecf79e58e7c1c8f82ff10124d.jpg) | Add to Reading ListSource URL: cm.bell-labs.comLanguage: English - Date: 1999-12-16 12:41:13
|
---|